The effect of nitrogen on the mechanical properties of tetrahedral amorphous carbon films deposited with a filtered cathodic vacuum arc
نویسنده
چکیده
The mechanical properties of both undoped and nitrogen containing tetrahedral amorphous carbon (ta-C and ta-C:N ) films, such as hardness and E-modulus, are investigated. The mechanical properties are related to the film structures. The ta-C and ta-C:N films are prepared in a filtered cathodic vacuum arc process. Nanoindentation testing is used to measure the mechanical properties of these films. Since the thickness of films prepared for this study is <100 nm, a continuous stiffness technique is therefore used to determine the mechanical properties of these films. For the lightly doped ta-C:N films, the mechanical properties are competitive with those of undoped ta-C. However, with a further increase in the nitrogen content in the films, the mechanical properties of the ta-C:N films drop. The extent of decrease of the mechanical properties of ta-C:N films shows the dependence on the 2 partial pressure or N ion energy. The reason for this may be due to the nitrogen doping efficiency. The excess nitrogen atoms contained in the films may promote the transformation from the sp3 bonding structure to sp2 structure and further enlarge the size of sp2 clusters, which causes the evident reduction of mechanical properties of the films. © 1999 Elsevier Science S.A. All
منابع مشابه
Properties of nitrogen doped tetrahedral amorphous carbon films prepared by filtered cathodic vacuum arc technique
The properties of nitrogen doped tetrahedral amorphous carbon films prepared by the filtered cathodic vacuum arc technique have been studied. The doping species, nitrogen ions, were produced by an ion beam source. The nitrogen flow rate was varied from 0.5 to 10 sccm while keeping other deposition conditions constant. The nitrogen content in deposited films was determined by Rutherford backscat...
متن کاملCyclic Voltammetric Behavior of Nitrogen-Doped Tetrahedral Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc
Nitrogen-doped tetrahedral amorphous carbon (ta-C :N) films were deposited by filtered cathodic vacuum arc (FCVA) technique using nitrogen as a background gas. The structure of the ta-C :N films was studied with X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy in terms of nitrogen flow rate used during the film deposition. Potential windows of the films measured in deaerated and un...
متن کاملMAGNETISATION AND ELECTRON SPIN RESONANCE STUDIES OF TETRAHEDRAL AMORPHOUS CARBON
The magnetisation and electron spin resonance (ESR) spectrum of two specimens of tetrahedral amorphous carbon (ta-C), deposited from a filtered cathodic arc, were measured over a wide temperature range. The magnetisation was found to consist of superparamagnetic, paramagnetic and diamagnetic contributions. The superparamagnetic contribution resembled that recently found in carbon prepared from ...
متن کاملDeposition of permalloy films by filtered cathodic vacuum arc
The filtered cathodic vacuum arc technique was employed to deposit magnetic films such as FeNi on silicon substrate. Using the normal cathode design, tetrahedral amorphous carbon and metals films can be deposited. If a magnetic target is used, the arc spot always preferably moves to the edge of the target and then extinguishes. Therefore, the arc is not stable and no film can be deposited. A ca...
متن کاملLinear sweep anodic stripping voltammetry of heavy metals from nitrogen doped tetrahedral amorphous carbon thin films
Nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films were deposited on p-Si (1 11) substrates (1×10−3 to 6×10−3 cm) by a filtered cathodic vacuum arc technique with different nitrogen flow rates (3 and 20 sccm). The ta-C:N film coated samples were used as working electrodes to detect trace heavy metals such as zinc (Zn), lead (Pb), copper (Cu) and mercury (Hg) by using linear sweep a...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 1999